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<img border=0 src="http://shivnath.c.googlepages.com/Google.JPG"/>Deposition of High Quality Films by the Inductively Coupled Plasma CVD Process - AZoNano.com Posted: 02 Nov 2011 03:58 AM PDT Deposition of High Quality Films by the Inductively Coupled Plasma CVD Process AZoNano.com Film stress is usually calculated by measuring the curvature change pre- and post-deposition of the film. This curvature difference as a result of film deposition is used to calculate stress based on Stoney's equation, which relates the biaxial modulus ...

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