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<img border=0 src="http://shivnath.c.googlepages.com/Google.JPG"/>Deposition of High Quality Films by the Inductively Coupled Plasma CVD Process - Azom.com Posted: 07 Feb 2012 06:28 PM PST Deposition of High Quality Films by the Inductively Coupled Plasma CVD Process Azom.com The system has accurate control over substrate temperature from -150°C to +400°C by using liquid nitrogen. This broad temperature range is essential for the advanced plasma deposition processes of different substrate materials.

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